Seiro Miyoshi: search on Z-Library

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1

Novel lithography design and verification methodology with patterning failure

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2009

Language:

english

File:

PDF, 854 KB

english, 2009

2

Pattern transfer processes for 157-nm lithography

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2002

Language:

english

File:

PDF, 1.21 MB

english, 2002

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Erdmann, Andreas, Kye, Jongwook, Furubayashi, Ken, Sho, Koutarou, Miyoshi, Seiro, Yamaguchi, Shinji, Iida, Kazunori, Usui, Satoshi, Morisaki, Tsuyoshi, Sato, Naoki, Mukai, Hidefumi

Year:

2016

Language:

english

File:

PDF, 416 KB

english, 2016

4

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - A novel lithography design and verification methodology with patterning failure

Miyoshi, Seiro, Chen, Alek C., Lin, Burn, Kobayashi, Yuuji, Tanaka, Satoshi, Yen, Anthony, Kawano, Kenji, Hashimoto, Kohji, Inoue, Soichi

Year:

2008

Language:

english

File:

PDF, 494 KB

english, 2008

5

Surface orientation dependence of growth rate of cubic GaN

Masaki Nagahara, Seiro Miyoshi, Hiroyuki Yaguchi, Kentaro Onabe, Yasuhiro Shiraki, Ryoichi Ito

Journal:

Journal of Crystal Growth

Year:

1994

Language:

english

File:

PDF, 331 KB

english, 1994

6

Photoluminescence excitation spectroscopy of GaP1−xNx alloys: conduction-band-edge formation by nitrogen incorporation

Hiroyuki Yaguchi, Seiro Miyoshi, Goshi Biwa, Masaya Kibune, Kentaro Onabe, Yasuhiro Shiraki, Ryoichi Ito

Journal:

Journal of Crystal Growth

Year:

1997

Language:

english

File:

PDF, 254 KB

english, 1997

7

Temperature dependence of photoluminescence of GaP1−xNx alloys

Yaguchi, Hiroyuki, Biwa, Goshi, Miyoshi, Seiro, Aoki, Daiichiro, Arimoto, Keisuke, Onabe, Kentaro, Ito, Ryoichi, Shiraki, Yasuhiro

Journal:

Journal of Crystal Growth

Year:

1998

Language:

english

File:

PDF, 124 KB

english, 1998

8

Nitrogen concentration dependence of photoluminescence decay time in GaP1−xNx alloys

Hiroyuki Yaguchi, Seiro Miyoshi, Hideo Arimoto, Shiro Saito, Hidefumi Akiyama, Kentaro Onabe, Yasuhiro Shiraki, Ryoichi Ito

Journal:

Solid-State Electronics

Year:

1997

Language:

english

File:

PDF, 237 KB

english, 1997

9

Semi-empirical tight-binding calculation of the electronic structure of GaP1−xNx (x = 0.25, 0.5, 0.75) alloys

Seiro Miyoshi, Kentaro Onabe

Journal:

Solid-State Electronics

Year:

1997

Language:

english

File:

PDF, 212 KB

english, 1997

10

Selective Growth of Cubic GaN in Small Areas on Patterned GaAs(100) Substrates by Metalorganic Vapor Phase Epitaxy

Nagahara, Masaki, Miyoshi, Seiro, Yaguchi, Hiroyuki, Onabe, Kentaro, Shiraki, Yasuhiro, Ito, Ryoichi

Journal:

Japanese Journal of Applied Physics

Year:

1994

File:

PDF, 997 KB

1994

11

Transmission Electron Microscope Observation of Cubic GaN Grown by Metalorganic Vapor Phase Epitaxy with Dimethylhydrazine on (001) GaAs

Kuwano, Noriyuki, Nagatomo, Yoshiyuki, Kobayashi, Kenki, Oki, Kensuke, Miyoshi, Seiro, Yaguchi, Hiroyuki, Onabe, Kentaro, Shiraki, Yasuhiro

Journal:

Japanese Journal of Applied Physics

Year:

1994

File:

PDF, 2.30 MB

1994

12

Formation of Cubic GaN on (111)B GaAs by Metal-Organic Vapor-Phase Epitaxy with Dimethylhydrazine

Kuwano, Noriyuki, Kobayashi, Kenki, Oki, Kensuke, Miyoshi, Seiro, Yaguchi, Hiroyuki, Onabe, Kentaro, Shiraki, Yasuhiro

Journal:

Japanese Journal of Applied Physics

Year:

1994

File:

PDF, 1.14 MB

1994

13

Growth Mechanism in the Metalorganic Vapor Phase Epitaxy of Metastable G a P 1- x N x Alloys: A Growth Interruption Study

Miyoshi, Seiro, Yaguchi, Hiroyuki, Onabe, Kentaro, Shiraki, Yasuhiro, Ito, Ryoichi

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 1.26 MB

1997

14

Band Structure of GaP 1- x N x ( x = 0.25, 0.5, 0.75) Ordered Alloys: Semiempirical Tight-Binding Calculation

Miyoshi, Seiro, Onabe, Kentaro

Journal:

Japanese Journal of Applied Physics

Year:

1998

File:

PDF, 1.29 MB

1998

15

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Application of polysilanes for deep-UV antireflective coating

Onishi, Yasunobu, Sato, Yasuhiko, Shiobara, Eishi, Miyoshi, Seiro, Matsuyama, Hideto, Abe, Junko, Ichinose, Hideo, Ohiwa, Tokuhisa, Nakano, Yoshihiko, Yoshikawa, Sawako, Hayase, Shuzi, Conley, Will

Year:

1999

Language:

english

File:

PDF, 1.11 MB

english, 1999

16

SPIE Proceedings [SPIE San Dieg - DL Tentative - San Diego, CA (Sunday 1 July 1990)] Nonlinear Optical Properties of Organic Materials III - Frequency doubling of laser diode light in organic channel waveguides

Kondo, Takashi, Hashizume, Naoki, Miyoshi, Seiro, Morita, Ryuji, Ogasawara, Nagaatsu, Umegaki, Shinsuke, Ito, Ryoichi, Khanarian, Garo

Year:

1990

Language:

english

File:

PDF, 382 KB

english, 1990

17

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Feasibility study of defects in 157-nm resist process

Wakamizu, Shinya, Kiba, Yukio, Kawaguchi, Etsurou, Miyoshi, Seiro, Furukawa, Takamitsu, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 119 KB

english, 2003

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Novel prediction methodology for etched hole patterning failure

Miyoshi, Seiro, Abe, Hideaki, Takahata, Kazuhiro, Ojima, Tomoko, Kajiwara, Masanari, Mimotogi, Shoji, Hashimoto, Kohji, Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 3.49 MB

english, 2012

19

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - 157-nm lithography with high numerical aperture lens for 70-nm technology node

Suganaga, Toshifumi, Kanda, Noriyoshi, Kim, J., Yamabe, Osamu, Watanabe, Kunio, Furukawa, Takamitsu, Miyoshi, Seiro, Itani, Toshiro, Cashmore, Julian S., Gower, Malcolm C., Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 903 KB

english, 2002

20

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Pattern transfer processes for 157-nm lithography

Miyoshi, Seiro, Furukawa, Takamitsu, Watanabe, Hiroyuki, Irie, Shigeo, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 1.10 MB

english, 2002

21

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Critical dimension (CD) control in 157-nm lithography

Hori, Shinya, Yoshihara, Kosuke, Kyoda, Hideharu, Matsui, Hidefumi, Furukawa, Takamitsu, Miyoshi, Seiro, Kawaguchi, Etsurou, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 344 KB

english, 2003

22

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Development of organic bottom antireflective coating for 157-nm lithography

Irie, Shigeo, Shigematsu, Masato, Miyoshi, Seiro, Sakamoto, Rikimaru, Mizusawa, Kenichi, Nakajima, Yasuyuki, Itani, Toshiro, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 260 KB

english, 2003

23

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Resist materials for 157-nm lithography

Toriumi, Minoru, Ishikawa, Seiichi, Miyoshi, Seiro, Naito, Takuya, Yamazaki, Tamio, Watanabe, Manabu, Itani, Toshiro, Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 267 KB

english, 2001

24

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Defect analysis in 157-nm photolithography process

Kiba, Yukio, Hori, Shinya, Miyahara, Osamu, Ono, Yuko, Kitano, Junichi, Miyoshi, Seiro, Furukawa, Takamitsu, Itani, Toshiro, Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 143 KB

english, 2002

25

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Mask defect specification in the spacer patterning process by using a fail-bit-map analysis

Miyoshi, Seiro, Chen, Alek C., Han, Woo-Sung, Yamaguchi, Shinji, Naka, Masato, Lin, Burn J., Yen, Anthony, Morishita, Keiko, Hirano, Takashi, Morinaga, Hiroyuki, Mashita, Hiromitsu, Kobiki, Ayumi, Kan

Year:

2009

Language:

english

File:

PDF, 650 KB

english, 2009

26

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - 157-nm bilayer resist: patterning and etching performance

Miyoshi, Seiro, Furukawa, Takamitsu, Kawaguchi, Etsurou, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 709 KB

english, 2003

27

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Environmental control for lithography with 157-nm exposure

Kitano, Junichi, Kiba, Yukio, Inazawa, Kouichiro, Miyoshi, Seiro, Watanabe, Hiroyuki, Furukawa, Takamitsu, Itani, Toshiro, Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 58 KB

english, 2002

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Sub-45nm resist process using stacked-mask process

Henderson, Clifford L., Seino, Yuriko, Kobayashi, Katsutoshi, Sho, Koutaro, Kato, Hirokazu, Miyoshi, Seiro, Kikutani, Keisuke, Abe, Junko, Hayashi, Hisataka, Ohiwa, Tokuhisa, Oonishi, Yasunobu, Ito, S

Year:

2008

Language:

english

File:

PDF, 1.41 MB

english, 2008

29

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - 157-nm lithography for 65-nm node SRAM-gate

Suganaga, Toshifumi, Irie, Shigeo, Miyoshi, Seiro, Kim, Jae-Hwan, Watanabe, Kunio, Kurose, Eiji, Furukawa, Takamitsu, Hagiwara, Takuya, Ishimaru, Toshiyuki, Itani, Toshiro, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 1.24 MB

english, 2003

30

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Mask specification guidelines in spacer patterning technology

Hashimoto, Kohji, Chen, Alek C., Lin, Burn, Mukai, Hidefumi, Miyoshi, Seiro, Yen, Anthony, Yamaguchi, Shinji, Mashita, Hiromitsu, Kobayashi, Yuuji, Kawano, Kenji, Hirano, Takashi

Year:

2008

Language:

english

File:

PDF, 819 KB

english, 2008

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Mask defect printability in the spacer patterning process

Miyoshi, Seiro, Kawahira, Hiroichi, Zurbrick, Larry S., Yamaguchi, Shinji, Hirano, Takashi, Mashita, Hiromitsu, Mukai, Hidefumi, Kobiki, Ayumi, Kobayashi, Yuuji, Hashimoto, Kohji, Inoue, Soichi

Year:

2008

Language:

english

File:

PDF, 1000 KB

english, 2008

32

The Resist Property of Fluoropolymer for 157-nm Lithography.

Ishikawa, Seiichi, Toriumi, Minoru, Miyoshi, Seiro, Naito, Takuya, Yamazaki, Tamio, Watanabe, Manabu, Itani, Toshio

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1024 KB

english, 2001

33

Polysilane Anti-Reflective Layer for Deep UV Lithography.

Sato, Yasuhiko, Miyoshi, Seiro, Matsuyama, Hideto, Onishi, Yasunobu, Nakano, Yoshihiko, Hayase, Shuji

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 360 KB

english, 1999

34

Hard Mask Process Using Chemically Amplified 157-nm Resists.

Furukawa, Takamitsu, Miyoshi, Seiro, Watanabe, Hiroyuki, Irie, Sigeo, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 1.36 MB

english, 2002